By use of extensive simulation, it is shown how a spread of the aluminium metallization over the intercathodic field oxide sensibly lowers the electric field at reverse biased p(+) n junctions, thus allowing use of higher drift fields. Based on the simulation results, the layout of a few test structures implementing alternative technological choices has been defined. The fabrication of these prototype detectors is presently in progress.

USE OF FIELD PLATE IN A LINEAR SILICON DRIFT DETECTOR (SDD)

VACCHI, Andrea
1995-01-01

Abstract

By use of extensive simulation, it is shown how a spread of the aluminium metallization over the intercathodic field oxide sensibly lowers the electric field at reverse biased p(+) n junctions, thus allowing use of higher drift fields. Based on the simulation results, the layout of a few test structures implementing alternative technological choices has been defined. The fabrication of these prototype detectors is presently in progress.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11390/1125283
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